Elaboration et caractérisation de couches minces de TiCN réalisées par pulvérisation magnétron RF

الموضوعات

علوم تطبيقية وتكنولوجية

الملخص

Titanium carbonitride is a material of high technological interest because of its beneficial proprieties including high hardness, low friction and chemical inertness. Chemical Vapor Deposition (CVD) processes are used, in a long time, to produce TiCN thin films. But the high substrate temperature condition work causes thermal damage to the deposited films and the substrate. But the physical vapor deposition (PVD) is mostly used because it’s an environmentally technique for coating deposition it’s used at relatively low substrate temperature. The sputtering is used for depositing TiCxNy films, the films properties are widely changed by the variation of the sputtering conditions, such as reactive gas pressure, total pressure, and substrate bias voltage. Therefore it was interesting to study the effect of the deposition parameters on deposited films.In this study, titanium carbonitride thin films have been deposited on silicon, glass and steel substrates by reactive RF sputtering (13.56 MHz) from a pure titanium target in Ar-CH4-N2 mixture. The main variables investigated are the composition of the CH4-N2 gas mixture, the total pressure, the discharge power, substrate bias, and the deposition time. The microstructure and chemical composition of the coating were studied respectively by X-ray diffraction (XRD) and energy dispersive spectroscopy (EDS). The optical and electrical properties will be discussed and correlated to the deposition parameters.

روابط وملفات

التعريف والنوع

رقم الوثيقة

013b5914-4bf8-43c2-abf6-cd63d257778c

رقم العقد

0

نوع الوسائط

Crawler

نوع المحتوى

الرسائل العلمية

صيغة المصدر

رسائل ماجيستير

نوع الملف

pdf text

أسماء الملفات

344729_1.pdf

بيانات النشر

ألقاب المؤلفين

[{"name_ar":"N.Saoula","title_ar":"اشراف","title_en":"Supervision"},{"name_ar":"مهند تازيروت","title_ar":"اعداد","title_en":"Preparation"}]

اللغة

French

المصدر والدورية

اسم المصدر

Elaboration et caractérisation de couches minces de TiCN réalisées par pulvérisation magnétron RF

المحتوى والصفحات

عدد الصفحات

0

إشراف وإعداد

الإشراف

N.Saoula

الإعداد

مهند تازيروت

الاقتباسات الببليوغرافية